LASER PATTERNING SUMMARY
The following is based on a paper by Rodney Waters, originally published in LIA Handbook of Laser Materials Processing, Laser Institute of America, Magnolia Publishing, Inc., Orlando FL, 2001, p.637. It was a distinct honor to have been invited to contribute the section on Laser Patterning. We offer this as proof of our pioneer world leader status in laser patterning, etching, and structuring of transparent conductive coatings on flat panel displays. Examples of coatings include Indium Tin Oxide (ITO), carbon nanotube (CNT), silver nanowire (AgNW), chrome, gold and all others without exception.
PRINCIPLES OF LASER PATTERNING BY SOLID STATE LASERS
- Direct write maskless pattern generation
- Dry process laser patterning and etching, single step
- Up to 1.6m scan area and up to 5m/sec writing rate
- Typical scan area is 450mm.
- Typical writing rate is under 1m/sec (depends on pattern geometry).
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